求助一篇IEICE文献

来源：学生作业帮编辑：作业帮分类：英语作业时间：2024/05/27 22:10:53

求助一篇IEICE文献
An Analysis of and a Method of Enhancing the Intensity of OBIRCH Signal for Defects Observation in VLSI Metal Interconnections
作者：N Kawamura,T Sakai,M Shimaya - IEICE transactions on …,1994 - search.ieice.org
摘要：The origin of and a method of enhancing the Optical Beam Induced Resistance Change
(OBIRCH) signal for defect observation in VLSI metal interconnections is discussed based
on a numerical analysis of three-dimensional thermal conduction and experimental results ...
这三篇文章同样是在IEICE上面,
Failure Analysis in Si Device Chips
作者：Kiyoshi NIKAWA
Highly Sensitive OBIRCH System for Fault Localization and Defect Detection
作者：Kiyoshi NIKAWA,Shoji INOUE,
Optical Beam Induced Current Technique as a Failure Analysis Tool of EPROMs
作者：Jun SATOH,Hiroshi NAMBA,Tadashi KIKUCHI,Kenichi YAMADA,Hidetoshi YOSHIOKA,Miki TANAKA,Ken SHONO,

请下载吧,目前只能帮你下载这一篇,其它的我再试试 An Analysis of and a Method of Enhancing the Intensity of OBIRCH Signal for Defects Observation in VLSI Metal Interconnections

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